| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a semitransmission type liquid crystal display wherein a manufacturing process can be simplified and a numerical aperture in a transmission region can be increased, and to provide its manufacturing method. <P>SOLUTION: The liquid crystal display is provided with a gate line of a dual structure, formed by laminating a first transparent conductive layer and a second opaque conductive layer; a data line formed by a crossing structure with the gate line via a gate insulating film and defining a pixel region having the transmission region and a reflection region; a thin-film transistor connected to the gate line and the data line; a pixel electrode having a first conductive layer formed in the pixel region and a second conductive layer laminated along an end part of the first conductive layer; a storage upper electrode superposed on the gate line via the gate insulating film and forming a storage capacitor; a transmission hole penetrated from an organic film covering the thin-film transistor to the gate insulating film and exposing side surfaces of a drain electrode and a storage electrode of the thin film transistor; and a reflection electrode, formed in the reflection region and connecting the drain electrode and the storage upper electrode to the second conductive layer of the pixel electrode via the edge part of the transmission hole. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
