发明名称 GAS EXCHANGE APPARATUS, ALIGNER AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a gas exchange apparatus which can purge a pellicle-reticle space with a low absorbing gas in a short time and can decrease the concentration of a light absorbing substance in the space. <P>SOLUTION: A gas supply attachment 323 is disposed to connect an inner tube 324 to a gas supply port 521 of a pellicle frame 520, and a low absorbing gas is supplied to the pellicle-reticle space via the inner tube 324 and the gas supply port 521. During the process, an outer tube 325 is rendered into a reduced pressure state by exhausting so that the gas supply attachment 323, and the pellicle frame 520 are sucked by appropriate sucking force against the separating force between the gas supply attachment 323 and the pellicle frame 520 by the gas supply through the inner tube 324. In an evacuating attachment 326, an inner tube 327 is evacuated, while an outer tube 328 is pressurized by supplying the gas. Thereby, the gas in the pellicle-reticle space 540 is forcibly evacuated, in a state with the evacuating attachment 326 stuck tightly to the pellicle frame 520. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005345876(A) 申请公布日期 2005.12.15
申请号 JP20040167101 申请日期 2004.06.04
申请人 NIKON CORP 发明人 AOKI TAKASHI
分类号 G03F1/62;G03F7/20;H01L21/027 主分类号 G03F1/62
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