发明名称 INTERFEROMETER, INTERFERENCE MEASURING METHOD, AND PRODUCTING TECHNIQUE OF PROJECTION OPTICAL SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To make it possible to detect fine waviness component having high spatial frequency with high precision by means of interferometer for face shape measurement. <P>SOLUTION: An interferometer detecting interference fringes, which are formed by detected light flux (LW) consisting of reflected light generated in a tested face (22a) and a predetermined reference light flux (LR) on a conjugate face (16a) of the aforementioned detected face (22a), is equipped with a regulating means (15A) adjusting intensity balance resulting from diffraction reflection component and mirror reflection component at the aforementioned tested face among the aforementioned tested light flux entering the aforementioned conjugate face in the direction the former is strengthened. In interference fringes at that time, fine waviness component of the tested face (22a) is amplified relatively and reflected comparing with waviness components other than this component. Thus, SN ratio of the fine waviness component is enhanced for this amplified magnitude. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005345444(A) 申请公布日期 2005.12.15
申请号 JP20040169073 申请日期 2004.06.07
申请人 NIKON CORP 发明人 NAKAYAMA SHIGERU
分类号 G01B9/02;G01M11/00;G03F7/20;H01L21/027 主分类号 G01B9/02
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