| 摘要 |
In one example, an apparatus for dispensing copper into a plating solution is provided which includes a cartridge containing an inlet and an outlet and comprising a copper metal source therein, a dosing device containing an oxidizing agent in fluid communication with the inlet, a tank for containing the plating solution in fluid communication with the outlet, a pH electrode adapted to contact the plating solution, and a system controller which receives input from the pH electrode and sends output to the dosing device. In another example, a method for replenishing copper in a plating solution is provided which includes flowing the plating solution from a plating cell to a replenishing system comprising a dosing device and a cartridge, dosing an oxidizing agent from the dosing device to the plating solution, exposing the plating solution to a copper metal source contained in the cartridge, enriching the plating solution with copper ions derived from the copper metal source, and flowing the enriched plating solution to the plating cell.
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