发明名称 |
GAS-BARRIER MULTILAYER STRUCTURE AND PROCESS FOR PRODUCING THE SAME |
摘要 |
<p>A gas-barrier multilayer structure which comprises at least one gas-barrier layer and at least one resin layer. The gas-barrier layer comprises a composite resin (C) comprising: a polyamide resin obtained by condensation-polymerizing m-xylylenediamine and a linear aliphatic alpha,omega-dicarboxylic acid; and a phyllosilicate treated with an organic swelling agent. The resin layer comprises a thermoplastic resin (D) having a lower glass transition temperature than the composite resin (C). The gas-barrier multilayer structure is obtained by subjecting an unstretched layered product to stretching/thermoforming under specific conditions. The stretching/thermoforming under specific conditions is effective in inhibiting fine cracks which may be present in the resins from causing blushing or a decrease in gas-barrier properties. Thus, a multilayer structure excellent in transparency and gas-barrier properties is obtained.</p> |
申请公布号 |
WO2005118289(A1) |
申请公布日期 |
2005.12.15 |
申请号 |
WO2005JP10275 |
申请日期 |
2005.06.03 |
申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC.;AMCOL INTERNATIONAL CORPORATION;KANDA, TOMOMICHI;MARUO, KAZUNOBU |
发明人 |
KANDA, TOMOMICHI;MARUO, KAZUNOBU |
分类号 |
B29C49/06;B29C49/22;B29C51/00;B29C51/04;B29C55/02;B29C55/16;B32B27/34;B65D1/09;B65D65/40;(IPC1-7):B32B27/34 |
主分类号 |
B29C49/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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