| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a substrate with a transparent conductive oxide film which is at a low resistance, high transparent, and has a good light scattering performance in all wavelength areas of a sunlight, and has an excellent mass production, and in particular, in which even when a transport type CVD device is used, variations of a C illuminant Hayes rate are sufficiently small; and to provide its manufacturing method and a photoelectric transfer element using the substrate. <P>SOLUTION: In the substrate with the transparent conductive oxide film, the transparent conductive oxide film which is constituted of a plurality of crests and a plurality of flat parts, and has a plurality of micro-projections continuously on the surface of the crests and flat parts is provided on the substrate. In the substrate with the transparent conductive oxide film, further, a spectral Hayes rate is 10 to 95% over all the wavelength areas of 400 to 800 nm, and a difference between a maximum value and a minimum value (the maximum value - the minimum value) of the spectral Hayes rate is not more than 50%. When the C illuminant Hayes rate is measured by a Hayes meter about the entire surface of the substrate, the C illuminant Hayes rate is 30 to 90%, and a difference between a maximum value and a minimum value (the maximum value - the minimum value) of the C illuminant Hayes rate is not more than 20%. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
