发明名称 |
Manufacture of x-ray detector, by depositing scintillator layer and cleaning substrate surface by plasma etching prior to application of plastics layer |
摘要 |
<p>The method involves depositing a scintillator layer (3) on the surface of a substrate (2), and applying a plastics layer which at least overlies the portion of the substrate surface surrounding the edge of the scintillator layer. At least part of the substrate surface (O) is cleaned by plasma etching, prior to the application of the plastics layer. The plastics layer comprises polyparaxylylene.</p> |
申请公布号 |
DE102004025120(A1) |
申请公布日期 |
2005.12.15 |
申请号 |
DE20041025120 |
申请日期 |
2004.05.21 |
申请人 |
SIEMENS AG |
发明人 |
FUCHS, MANFRED;OPITZ, MARTINA |
分类号 |
G01T1/20;G01T1/29;G21K4/00;(IPC1-7):G21K4/00 |
主分类号 |
G01T1/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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