发明名称 Manufacture of x-ray detector, by depositing scintillator layer and cleaning substrate surface by plasma etching prior to application of plastics layer
摘要 <p>The method involves depositing a scintillator layer (3) on the surface of a substrate (2), and applying a plastics layer which at least overlies the portion of the substrate surface surrounding the edge of the scintillator layer. At least part of the substrate surface (O) is cleaned by plasma etching, prior to the application of the plastics layer. The plastics layer comprises polyparaxylylene.</p>
申请公布号 DE102004025120(A1) 申请公布日期 2005.12.15
申请号 DE20041025120 申请日期 2004.05.21
申请人 SIEMENS AG 发明人 FUCHS, MANFRED;OPITZ, MARTINA
分类号 G01T1/20;G01T1/29;G21K4/00;(IPC1-7):G21K4/00 主分类号 G01T1/20
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