发明名称 Semiconductor apparatus and method of manufacturing same, and method of detecting defects in semiconductor apparatus
摘要 A semiconductor apparatus comprising: a semiconductor substrate having a device region and a periphery region surrounding the device region; a semiconductor device provided in the device region of the semiconductor substrate; a first electrode pad provided on the semiconductor substrate; a second electrode pad provided on the semiconductor substrate; a strip-like, first conductivity type semiconductor pattern; and a strip-like, second conductivity type semiconductor pattern. The strip-like, first conductivity type semiconductor pattern extends in the periphery region of the semiconductor substrate, and the first electrode pad is electrically connected to one end of the first conductivity type semiconductor pattern. The strip-like, second conductivity type semiconductor pattern constitutes a p-n junction in conjunction with the first conductivity type semiconductor pattern. The first and second electrode pads are electrically connected to both ends of the second conductivity type semiconductor pattern.
申请公布号 US2005275076(A1) 申请公布日期 2005.12.15
申请号 US20050148331 申请日期 2005.06.09
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SUGIURA MASAYUKI;KURIYAMA YASUHIKO;SUGIYAMA TORU;TANABE YOSHIKAZU;SHIBAMIYA MAKOTO
分类号 H01L21/60;H01L23/495;H01L23/544;(IPC1-7):H01L23/495 主分类号 H01L21/60
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