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发明名称
METHOD FOR PATTERNING PHOTORESIST
摘要
申请公布号
KR20050116502(A)
申请公布日期
2005.12.13
申请号
KR20040041581
申请日期
2004.06.08
申请人
DONGBUANAM SEMICONDUCTOR INC.
发明人
LEE, IL HO
分类号
H01L21/027;(IPC1-7):H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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