发明名称 Lead plating method for GMR head manufacture
摘要 A major problem in Lead Overlay design for GMR structures is that the magnetic read track width is wider than the physical read track width. This is due to high interfacial resistance between the leads and the GMR layer which is an unavoidable side effect of prior art methods. The present invention uses electroplating preceded by a wet etch to fabricate the leads. This approach requires only a thin protection layer over the GMR layer to ensure that interface resistance is minimal. Using wet surface cleaning avoids sputtering defects and plating is compatible with this so the cleaned surface is preserved Only a single lithography step is needed to define the track since there is no re-deposition involved.
申请公布号 US6973712(B2) 申请公布日期 2005.12.13
申请号 US20020093106 申请日期 2002.03.07
申请人 HEADWAY TECHNOLOGIES, INC. 发明人 CHEN CHAO-PENG;LIN KEVIN;CHANG JEI-WEI;JU KOCHAN;WANG HUI-CHUAN
分类号 G11B5/31;G11B5/39;(IPC1-7):G11B5/127;H04R31/00 主分类号 G11B5/31
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