发明名称 Method of making photolithographically-patterned out-of-plane coil structures
摘要 An out-of-plane micro-structure which can be used for on-chip integration of high-Q inductors and transformers places the magnetic field direction parallel to the substrate plane without requiring high aspect ratio processing. The photolithographically patterned coil structure includes an elastic member having an intrinsic stress profile. The intrinsic stress profile biases a free portion away from the substrate forming a loop winding. An anchor portion remains fixed to the substrate. The free portion end becomes a second anchor portion which may be connected to the substrate via soldering or plating. A series of individual coil structures can be joined via their anchor portions to form inductors and transformers.
申请公布号 US2005270135(A1) 申请公布日期 2005.12.08
申请号 US20050197675 申请日期 2005.08.04
申请人 XEROX CORPORATION 发明人 CHUA CHRISTOPHER L.;LEMMI FRANCESCO;VAN SCHUYLENBERGH KOENRAAD F.;LU JENG P.;FORK DAVID K.;PEETERS ERIC;SUN DECAI;SMITH DONALD L.;ROMANO LINDA T.
分类号 H01F41/04;G01R1/067;G01R3/00;G03C5/00;H01F17/00;H01F17/02;H01F27/29;H01L21/02;H01L21/60;H01L21/768;H01L23/485;H01L23/49;H01L23/498;H01L23/522;H01R9/03;H05K7/02;(IPC1-7):H01F27/29 主分类号 H01F41/04
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