发明名称 SURFACE POSITION DETECTION APPARATUS AND EXPOSURE APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a surface position detection apparatus capable of detecting a surface position while disposing a light transmitting system and a light receiving system at arbitrary positions even in a situation that arrangements of the light transmitting system and the light receiving system in an oblique incident type focus detection system are limited, respectively. <P>SOLUTION: A surface position detection apparatus 1 comprises a light transmitting system 10 which emits light flux L1, an optical returning system 3 which reversely changes the direction of the light flux L1 emitted from the light transmitting system 10 within a surface approximately parallel with a surface PS to be detected, and a light receiving system 20 which receives light flux L2 only through a detection area AR and the optical return system 3. The outgoing light flux L1 passing between the light transmitting system 10 and the optical return system 3 is radiated from an oblique direction to the surface PS to be detected, and the outgoing light flux L1 and the incoming light flux L2 are spatially separated. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005340457(A) 申请公布日期 2005.12.08
申请号 JP20040156325 申请日期 2004.05.26
申请人 NIKON CORP 发明人 INOUE JIRO
分类号 G01B11/00;G02B7/28;G03F7/207;H01L21/027 主分类号 G01B11/00
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