| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus for improving the yield. <P>SOLUTION: The exposure apparatus which carries out alignment and exposure in the entire region of a substrate or in each region preliminarily segmented is equipped with: a means 36 to judge whether the substrate can be exposed or not based on a substrate mark and a mask mark formed on the substrate and a mask 10 having a pattern to be formed in the substrate, respectively, both marks photographed by a photographing means 20; a memory means 32 to memorize the information about the substrate judged as inappropriate for exposure and the information about a region not exposed which is the region judged as inappropriate for exposure, as error information; and an exposure controlling means 31 which controls to carry out alignment and exposure in the unexposed region based on the error information memorized in the memory means 32 when a substrate having an unexposed region is again introduced after completing the alignment and exposure on a series of substrates in a predetermined number. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
