| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate washing device which is capable of easily performing uniform washing all over the upper surface of a substrate and improving throughput. SOLUTION: A double fluid nozzle 30 mixes an N<SB>2</SB>gas and pure water supplied by supply ducts 51b, 52b and discharges a mixed fluid M to a substrate W. The mixed fluid M discharged from the double fluid nozzle 30 has a predetermined spreading angleθ. The predetermined spreading angleθis adjusted by the internal structure of the double fluid nozzle 30, the flow rate of the mixed fluids M supplied from the supply ducts 51b, 52b and a ratio of the pure water, and the N<SB>2</SB>gas in the mixed fluid M. The feed area FL of the mixed fluid M on the substrate W is adjusted by a height H from the lower end of the double fluid nozzle 30 to the surface of the substrate W. Thus, the mixed fluid M is discharged from the double fluid nozzle 30 so as to cover all the upper surface of the surface of the substrate W. COPYRIGHT: (C)2006,JPO&NCIPI
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