DRESSING PLATE FOR ABRASIVE CLOTH, DRESSING METHOD FOR ABRASIVE CLOTH, AND WORKPIECE POLISHING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a dressing plate performing uniform dressing to a double-sided polishing device without being influenced by a polishing table shape and performing uniform grinding by eliminating the influence of upper and lower polishing table shapes even when using particularly high hardness abrasive cloth.

SOLUTION: The dressing plate 1 for the abrasive cloth for dressing the abrasive cloth of an upper polishing table and the abrasive cloth of a lower polishing table simultaneously in the double-sided polishing device provided with the upper polishing table and lower polishing table each with the abrasive cloth attached thereto, comprises at least two plate bodies 2 and an elastic body layer 3 provided between the plate bodies.

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