| 摘要 |
A method for manufacturing gate electrode of semiconductor device using an aluminium nitride film is provided, the method including cleaning a surface of a semiconductor substrate, nitriding the surface of the substrate, forming a gate dielectric film comprising an aluminium nitride film on the surface of a semiconductor substrate, depositing a gate conductive layer and a hard mask layer on the gate dielectric film, and etching the hard mask layer, the gate conductive layer, the gate dielectric film to form a gate electrode.
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