发明名称 Charged particle beam apparatus and irradiation method
摘要 A control unit controls incident position of beam (4) on lenses, such that off-axis chromatic aberration produced by objective lens (7) and other lenses gets canceled out. An independent claim is also included for sample irradiation method.
申请公布号 EP1398818(A3) 申请公布日期 2005.12.07
申请号 EP20030020626 申请日期 2003.09.10
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 SATO, MITSUGU;TODOKORO, HIDEO;OSE, YOICHI;EZUMI, MAKOTO;ARAI, NORIKI;DOI, TAKASHI
分类号 G01Q20/02;G01Q30/02;H01J3/14;H01J29/70;H01J37/153;H01J37/28 主分类号 G01Q20/02
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