发明名称 THIN FILM DEPOSITION SYSTEM, THIN FILM DEPOSITION METHOD, ELECTRO-OPTIC APPARATUS MANUFACTURING METHOD, ELECTRO-OPTIC APPARATUS, AND ELECTRONIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a thin film deposition system and a thin film deposition method capable of suppressing the effect of the plasma heat, to provide an electro-optic apparatus provided with a light emitting layer suppressed in thermal degradation, to provide a method for manufacturing the electro-optic apparatus, and to provide an electronic apparatus provided with the electro-optic apparatus. SOLUTION: In the thin film deposition system, by which a thin film is formed on a substrate facing an evaporation source by evaporating a film material while emitting plasma onto the evaporation source storing the film material in a film deposition chamber, the film deposition chamber has a film deposition area to deposit a thin film on a substrate, a waiting area to wait the substrate, a plasma shielding means provided between the film deposition area and the waiting area, and a communication unit to communicate the film deposition area with the waiting area. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005330509(A) 申请公布日期 2005.12.02
申请号 JP20040147688 申请日期 2004.05.18
申请人 SEIKO EPSON CORP 发明人 YAMAUCHI YUKIO
分类号 H05B33/10;C23C14/24;C23C14/32;H01L51/50;H05B33/14;(IPC1-7):C23C14/24 主分类号 H05B33/10
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