| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition excellent in resolution and line end foreshortening resistance as a chemically amplified resist sensitive to far-ultraviolet rays. <P>SOLUTION: The copolymer comprises recurring units represented by formulae (1) and (2) and has a weight-average molecular weight in terms of polystyrene of 3,000-100,000 as measured by the gel permeation chromatography. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
