| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mask for exposure capable of suppressing the increase of a street width. <P>SOLUTION: A mask membrane is supported by a support frame. A transfer pattern to be imprinted is formed by the composition of two or more apertures which penetrate the mask membrane. Moreover, a relative position to the transfer pattern to be imprinted is pinpointed, and formed in one surface of the mask membrane, so that an alignment mark composed of a recess shallower than the thickness of a mask membrane may be formed. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
