发明名称 Electron beam lens for micro-column electron beam apparatus and method of fabricating the same
摘要 Provided is an electron beam lens for a micro-column electron beam apparatus and a method of manufacturing the same. A photosensitive glass substrate is used as a base isolation substrate and a thin metal film is grown by a plating method. Holes through which electron beam passes are formed by a lift off method after forming a resist pattern shaped as a hole on a seed metal layer and plating the thin metal film.
申请公布号 US2005266322(A1) 申请公布日期 2005.12.01
申请号 US20050174891 申请日期 2005.07.01
申请人 CHOI SANG K;KIM DAE Y 发明人 CHOI SANG K.;KIM DAE Y.
分类号 G02B3/00;H01J1/02;H01J3/18;H01J9/02;H01J9/14;H01J37/12;(IPC1-7):H01J1/02 主分类号 G02B3/00
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