发明名称 |
Electron beam lens for micro-column electron beam apparatus and method of fabricating the same |
摘要 |
Provided is an electron beam lens for a micro-column electron beam apparatus and a method of manufacturing the same. A photosensitive glass substrate is used as a base isolation substrate and a thin metal film is grown by a plating method. Holes through which electron beam passes are formed by a lift off method after forming a resist pattern shaped as a hole on a seed metal layer and plating the thin metal film.
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申请公布号 |
US2005266322(A1) |
申请公布日期 |
2005.12.01 |
申请号 |
US20050174891 |
申请日期 |
2005.07.01 |
申请人 |
CHOI SANG K;KIM DAE Y |
发明人 |
CHOI SANG K.;KIM DAE Y. |
分类号 |
G02B3/00;H01J1/02;H01J3/18;H01J9/02;H01J9/14;H01J37/12;(IPC1-7):H01J1/02 |
主分类号 |
G02B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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