发明名称 |
Method and its apparatus for inspecting particles or defects of a semiconductor device |
摘要 |
An apparatus for optically inspecting particles and/or defects correlates sizes of particles and/or defects to a cause of failure in an inspection result. A data processing circuit points out a cause of failure from the statistics on the inspection result, and displays information on the inspection result. A failure analysis is conducted by setting a threshold for identifying a failure in each of regions on a semiconductor device or the like to statistically evaluate detected particles.
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申请公布号 |
US2005264798(A1) |
申请公布日期 |
2005.12.01 |
申请号 |
US20050190838 |
申请日期 |
2005.07.28 |
申请人 |
NISHIYAMA HIDETOSHI;NOGUCHI MINORI;OHSHIMA YOSHIMASA;HAMAMATSU AKIRA;WATANABE KENJI;WATANABE TETSUYA;JINGU TAKAHIRO |
发明人 |
NISHIYAMA HIDETOSHI;NOGUCHI MINORI;OHSHIMA YOSHIMASA;HAMAMATSU AKIRA;WATANABE KENJI;WATANABE TETSUYA;JINGU TAKAHIRO |
分类号 |
G01N21/27;G01N21/47;G01N21/88;G01N21/94;G01N21/95;(IPC1-7):G01N21/88 |
主分类号 |
G01N21/27 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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