| 发明名称 |
Photosensitive composition and pattern-forming method using the photosensitive composition |
| 摘要 |
A photosensitive composition comprises (A) a sulfonium or iodonium salt having an anion represented by one of formulae (I) and (II): wherein Y represents an alkylene group substituted with at least one fluorine atom, and R represents an alkyl group or a cycloalkyl group.
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| 申请公布号 |
US2005266336(A1) |
申请公布日期 |
2005.12.01 |
| 申请号 |
US20050041748 |
申请日期 |
2005.01.25 |
| 申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
KODAMA KUNIHIKO |
| 分类号 |
G03F7/004;G03F7/038;G03F7/039;G03F7/075;H01L21/027;(IPC1-7):G03C1/492 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 地址 |
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