| 发明名称 |
Lithographic apparatus, device manufacturing method. |
| 摘要 |
In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate. |
| 申请公布号 |
SG116542(A1) |
申请公布日期 |
2005.11.28 |
| 申请号 |
SG20040002415 |
申请日期 |
2004.05.06 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BOB STREEFKERK;ERIK ROELOF LOOPSTRA CHRISTIAAN ALEXANDER HOOGENDAM JEROEN JOHANNES SOPHIA MARIA MERTENS JOERI LOF FRITS VAN DER MEULEN ANTONIUS THEODORUS ANNA MARIADERKSEN SJOERD NICOLAAS LAMBERTUS DONDERS HENRIKUS HERMAN MARIE COX JOHANNES JACOBUS MATHEUS BASELMANS LEVINUS PETER BAKKER;JOHANNES CATHARINUS HUBERTUS MULKENS;GERARDUS PETRUS MATTHIJS VAN NUNEN;KLAUS SIMON;BERNARDUS ANTONIUS SLAGHEKKE;ALEXANDER STRAAIJER;JAN-GERARD CORNELIS VAN DER TOORN;MARTIJN HOUKES |
| 分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
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