发明名称 Electroplating panel with plating thickness-compensation structures
摘要 An electroplating panel having a strip of components to be electroplated. The components are spaced apart from one another along an edge of the strip. The panel includes a main buss and a plating thickness-compensation structure electrically connecting the main buss to the components at the edge of the strip. The plating thickness-compensation structure includes a first buss member and a second buss member. The first buss member extends along the edge of the strip and electrically connected to each component. The second buss member is electrically connected to main buss. The plating thickness-compensation structure further includes one or more links electrically connecting the first and second buss members.
申请公布号 US6966976(B1) 申请公布日期 2005.11.22
申请号 US20030337802 申请日期 2003.01.07
申请人 HUTCHINSON TECHNOLOGY INCORPORATED 发明人 MCGRAW COLIN M.;PELTOMA ANDREW J.
分类号 C25D17/06;C25D21/12;(IPC1-7):C25D17/06 主分类号 C25D17/06
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