| 摘要 |
The invention relates to a plasma source for producing an inductively coupled plasma, comprising at least one exciting coil (1) for generating a fluctuating magnetic flux and comprising a magnetic pole shoe arrangement (2) in which the exciting coil (1) is placed in slots in the pole shoe arrangement (2) in such a manner that the inductively coupled plasma is produced in front of the magnetic pole shoe arrangement (2) and inside a vacuum chamber. The plasma source comprises at least one multipole magnet arrangement (8, 9) such that the magnetic field of the multipole magnet arrangement (8, 9) is superimposed by the inductively coupled plasma. |
