| 摘要 |
<P>PROBLEM TO BE SOLVED: To realize the inspection of a pattern of high sensitivity by reducing the effect of the brightness irregularity of the pattern caused by the difference or the like of film thickness in a pattern inspection device constituted so as to compare the images of the corresponding regions of two patterns formed so as to become the same pattern to judge the non-coincidence part of the images as a flaw, and to realize the pattern inspection device capable of developing various flaws and adaptable to a wide range of a process. <P>SOLUTION: The pattern inspection device constituted so as to compare the images of the corresponding regions of two patterns formed so as to become the same pattern to determine the non-coincidence part of the images as a flaw is equipped with a plurality of detection systems and a plurality of the image comparing processing systems corresponding thereto. Further, the pattern inspection device is equipped with a means for converting the gradation of an image signal between the compared images in a plurality of different processing units and, even if the brightness difference is produced in the same pattern between the images, a flaw can be accurately detected. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
