INSPECTION METHOD OF REFLECTION TYPE MASK

摘要

PROBLEM TO BE SOLVED: To provide an inspection method of a reflection type mask capable of inspecting more correctly and simply the existence of a defect including the phase defect of the reflection type mask.

SOLUTION: The inspection method of the reflection type mask formed by multilayer films includes a step for measuring a secondary radiation emitted from the multilayer films at the time of entering light with a wavelength of 2 to 40nm in the reflection type mask, and a step for judging the existence of the defect of the reflection type mask on the basis of the measurement values.

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