发明名称 MANUFACTURING METHOD OF POLYMER FOR RESIST
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a polymer for resists which permits ready and stable recovery of the polymer containing a small amount of residual monomers and solvents as a powder. <P>SOLUTION: The manufacturing method of the polymer for resists comprises solution-polymerizing monomers to be converted into constituting units of the aimed polymer by the polymerization in a solvent to obtain a solution containing the aimed polymer, and mixing a solvent for reprecipitation with the solution containing the polymer so that the SP value of the whole solvent falls within the range of 30-35 [MPa<SP>1/2</SP>] thereby to cause the polymer to deposit. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005320444(A) 申请公布日期 2005.11.17
申请号 JP20040139853 申请日期 2004.05.10
申请人 MITSUBISHI RAYON CO LTD 发明人 KANEKO ISAO;INABA HIDEYUKI;KUWANO HIDEAKI;WAKIZAKA YUKIYA
分类号 G03F7/039;C08F6/12 主分类号 G03F7/039
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