发明名称 |
Positioning apparatus, exposure apparatus, and device manufacturing method |
摘要 |
A positioning apparatus is disclosed. The positioning apparatus comprises first and second bases, and two moving elements which are guided by the first and second bases to move on the first and second bases. A distance is ensured between the first and second bases. When the two moving elements move between the first and second bases, both of a guide surface of the first base and a guide surface of the second base are used.
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申请公布号 |
US2005255624(A1) |
申请公布日期 |
2005.11.17 |
申请号 |
US20050127154 |
申请日期 |
2005.05.12 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
MIYAJIMA YOSHIKAZU |
分类号 |
H01L21/027;G03F7/20;H01L21/00;H01L21/68;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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