| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a thin film magnetic head capable of both suppressing generation of side erase and securing overwriting characteristics. SOLUTION: A photoresist pattern 35 is formed so that an aperture width of an aperture 35K is gradually narrowed as the aperture approaches a seed layer 12 by exposing a photoresist film to light while a reflection suppressing layer 31 is formed in an area F1 to perform patterning and then a precursor magnetic pole partial layer 13AZ is formed in the aperture 35K of the photoresist pattern 35. Since relative difference in the exposure range of the photoresist film is generated based on existence of the reflection suppressing layer 31 between the area F1 and an area F2, a tilt angleωR of a defined surface 35RM of the photoresist pattern 35 is made larger than a tilt angleωL of a defined surface 35LM. Thereby, the precursor magnetic pole partial layer 13AZ is formed so that its sectional shape is asymmetrical reversed trapezoidal shape reflecting size relation between tilt anglesωR andωL. COPYRIGHT: (C)2006,JPO&NCIPI
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