发明名称 |
Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system |
摘要 |
The embodiments of the invention describe a process chamber, such as an ALD chamber, that has gas delivery conduits with gradually increasing diameters to reduce Joule-Thompson effect during gas delivery, a ring-shaped gas liner leveled with the substrate support to sustain gas temperature and to reduce gas flow to the substrate support backside, and a gas reservoir to allow controlled delivery of process gas. The gas conduits with gradually increasing diameters, the ring-shaped gas liner, and the gas reservoir help keep the gas temperature stable and reduce the creation of particles.
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申请公布号 |
US2005252449(A1) |
申请公布日期 |
2005.11.17 |
申请号 |
US20050119388 |
申请日期 |
2005.04.29 |
申请人 |
NGUYEN SON T;SANGAM KEDARNATH;SCHWARTZ MIRIAM;CHOI KENRIC;BHAT SANJAY;NARWANKAR PRAVIN K;KHER SHREYAS;SHARANGAPANI RAHUL;MUTHUKRISHNAN SHANKAR;DEATON PAUL |
发明人 |
NGUYEN SON T.;SANGAM KEDARNATH;SCHWARTZ MIRIAM;CHOI KENRIC;BHAT SANJAY;NARWANKAR PRAVIN K.;KHER SHREYAS;SHARANGAPANI RAHUL;MUTHUKRISHNAN SHANKAR;DEATON PAUL |
分类号 |
C23C16/00;C23C16/02;C23C16/40;C23C16/44;C23C16/448;C23C16/455;C23C16/56;F22B1/00;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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