| 摘要 |
PROBLEM TO BE SOLVED: To provide a combinatorial method for forming a film, which precisely controls various film-forming conditions in a sputtering process, and efficiently produces a coating film in different film-forming conditions, and to provide an apparatus therefor. SOLUTION: The combinatorial method for forming the film is a method for coating a thin film on a substrate arranged in a vacuum chamber, and comprises the steps of: setting two or more substrates so as to be movable to a position to be film-formed or a position to be cooled; sequentially moving only a substrate to be coated to the position of the film to be formed, if the substrate is in the cooling position, in a state of being cooled by a cooling mechanism, in one evacuation process; and forming the film while changing a film-forming condition. COPYRIGHT: (C)2006,JPO&NCIPI
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