METHOD FOR FORMING OXIDE COATING FILM, OXIDE COATING FILM AND COATING FILM STRUCTURE

摘要

A method for forming an oxide coating film with good surface morphology and crystal quality by organic metal chemical vapor deposition using two or more kinds of organic metal compound material gas and oxygen gas is disclosed. A film-forming apparatus comprising a first supply port (11A), a second supply port (11B), a third supply port (11C) and a film formation chamber (7) is used therefor. A first material gas (A) containing a first organic metal compound is supplied through the first supply port (11A) into the chamber (7). A second material gas (B) containing a second organic metal compound is supplied through the second supply port (11B) into the chamber (7). Oxygen gas (C) is supplied through the third supply port (11C) into the chamber (7). Within the chamber (7), the oxygen gas (D) comes into contact with the first material gas (E) before being mixed with the second material gas (F).