CLEANING APPARATUS FOR SEMICONDUCTOR WAFER,申请号KR20040033511-传众专利搜索

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发明名称	CLEANING APPARATUS FOR SEMICONDUCTOR WAFER
摘要
申请公布号	KR20050108599(A)	申请公布日期	2005.11.17
申请号	KR20040033511	申请日期	2004.05.12
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	SHIN, GIL SUNG
分类号	H01L21/304;(IPC1-7):H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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