发明名称 |
VERFAHREN ZUR HERSTELLUNG EINER GITTERSTRUKTUR, OPTISCHES ELEMENT, EVANESZENTFELDSENSORPLATTE, MIKROTITERPLATTE UND NACHRICHTENTECHNISCHER OPTISCHER KOPPLER SOWIE VORRICHTUNG ZUR ÜBERWACHUNG EINER WELLENLÄNGE |
摘要 |
<p>Production of a grid structure comprises covering a surface section of a substrate with a photo lacquer layer (10); arranging the surface section in the near field of a phase mask (14) which has been structured according to a laser two beam interference method; irradiating the phase mask under the Littrow angle (theta L) or not more than 5 [deg]; developing the lacquer; etching the surface section to form the grid structure and removing the photo lacquer layer. Preferred Features: The phase mask is a transparent substrate and comprises a structured layer which the grid structure optically inactivates. The structured layer is made of a chrome layer.</p> |
申请公布号 |
AT307348(T) |
申请公布日期 |
2005.11.15 |
申请号 |
AT20010901098T |
申请日期 |
2001.01.26 |
申请人 |
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发明人 |
MAISENHOELDER, BERND;EDLINGER, JOHANNES;HEINE, CLAUS;PAWLAK, MICHAEL;DUVENECK, GERT |
分类号 |
G01N21/64;G01N21/552;G01N21/77;G01N33/53;G01N37/00;G02B5/18;G02B6/02;G02B6/12;G02B6/122;G02B6/124;G02B6/13;G02B6/34;(IPC1-7):G02B6/34 |
主分类号 |
G01N21/64 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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