发明名称 |
AMORPHOUS OXIDE SURFACE FILM FOR METALLIC IMPLANTABLE DEVICES AND METHOD FOR PRODUCTION THEREOF |
摘要 |
An amorphous oxide surface film for metallic implantable devices and method for production thereof, wherein the amorphous oxide film is characterized by a high concentration of oxygen, chromium and hydroxyl ions within the film so as to form a non-stoichiometric chromium oxide with significant negative charge; thereby, improving the corrosion resistance and biocompatibility of the metallic implantable device, and thus significantly reducing the degree of thrombogenicity and restenosis. |
申请公布号 |
WO2005104993(A2) |
申请公布日期 |
2005.11.10 |
申请号 |
WO2005US07405 |
申请日期 |
2005.03.07 |
申请人 |
SU, YEA-YANG;SHIH, CHUN-CHE;SHIH, CHUN-MING;LIN, SHING-JONG |
发明人 |
SU, YEA-YANG;SHIH, CHUN-CHE;SHIH, CHUN-MING;LIN, SHING-JONG |
分类号 |
A61F2/00;A61F2/82;A61L27/04;A61L27/50;A61L31/02;A61L31/14 |
主分类号 |
A61F2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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