发明名称 AMORPHOUS OXIDE SURFACE FILM FOR METALLIC IMPLANTABLE DEVICES AND METHOD FOR PRODUCTION THEREOF
摘要 An amorphous oxide surface film for metallic implantable devices and method for production thereof, wherein the amorphous oxide film is characterized by a high concentration of oxygen, chromium and hydroxyl ions within the film so as to form a non-stoichiometric chromium oxide with significant negative charge; thereby, improving the corrosion resistance and biocompatibility of the metallic implantable device, and thus significantly reducing the degree of thrombogenicity and restenosis.
申请公布号 WO2005104993(A2) 申请公布日期 2005.11.10
申请号 WO2005US07405 申请日期 2005.03.07
申请人 SU, YEA-YANG;SHIH, CHUN-CHE;SHIH, CHUN-MING;LIN, SHING-JONG 发明人 SU, YEA-YANG;SHIH, CHUN-CHE;SHIH, CHUN-MING;LIN, SHING-JONG
分类号 A61F2/00;A61F2/82;A61L27/04;A61L27/50;A61L31/02;A61L31/14 主分类号 A61F2/00
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