| 发明名称 |
MATERIALS AND METHODS FOR IMPRINT LITHOGRAPHY |
| 摘要 |
One embodiment of the present invention relates to an imprinting material for imprint lithography that includes the surfactant 3M(TM) Novec(TM) Fluorosurfactant FC-4432, and another embodiment of the present invention relates to a method for imprint lithography that uses the imprinting material. |
| 申请公布号 |
WO2005072120(A3) |
申请公布日期 |
2005.11.10 |
| 申请号 |
WO2005US01054 |
申请日期 |
2005.01.11 |
| 申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
XU, FRANK, Y.;LAD, PANKAJ, B.;MCMACKIN, IAN, M. |
| 分类号 |
B41C1/10;B41M7/00;B41N1/00;G03F7/00 |
主分类号 |
B41C1/10 |
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