发明名称 GALLIUM NITRIDE SYSTEM LIGHT EMITTING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To narrow a band of an emission spectrum of a gallium nitride system light emitting device. <P>SOLUTION: The gallium nitride system light emitting device has a sapphire substrate 10 on which a low temperature buffer layer 12 and a high temperature buffer layer (GaN system layer) 14 are formed as a foundation layer on which an n-type contact layer 16, an n-type clad layer 18, a light emitting layer 20, a p-type clad layer 22, and a p-type contact layer 24 are laminated. The n-type contact layer 16 is an InGaN and its band gap energy is smaller enough than that of a band gap of the light emitting layer 20 and its film thickness is not less than 200 nm, so that the light emitted downward from the light emitting layer 20 is absorbed to narrow a half-power bandwidth of the emission spectrum. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005317823(A) 申请公布日期 2005.11.10
申请号 JP20040135162 申请日期 2004.04.30
申请人 NITRIDE SEMICONDUCTOR CO LTD 发明人 SATO TOSHIAKI;WADA NAOKI;SAKAI SHIRO
分类号 H01L33/06;H01L33/12;H01L33/32;H01L33/36 主分类号 H01L33/06
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