| 摘要 |
PROBLEM TO BE SOLVED: To suitably perform the treatment of a substrate by forming a drain passage to the bottom parts of recesses, in which support rolls are attached, to draw out particles internally formed along with a treatment liquid or the like. SOLUTION: The treatment liquid supply apparatus is composed of an upper treatment part 10 and a lower treat part 20, and the treatment liquid is supplied to the substrate fed to the gap between both treatment parts from both sides of the substrate. A required number of recessed parts are formed to the upper surface of a ceiling plate 22 of the lower treatment part and support rolls 30 are arranged in the recesses so that the upper ends of them are exposed from the ceiling plate to regulate the downward bending of the fed-in substrate due to the own weight of the substrate. The drain holes communicating with the outside are provided to the bottom parts of the recesses, in which the support rolls 30 are mounted, to discharge the particles formed accompanying the rotation of the support rolls 30 to the outside. COPYRIGHT: (C)2006,JPO&NCIPI
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