APPARATUS AND METHOD FOR HIGH RESOLUTION IN-SITU ILLUMINATION SOURCE MEASUREMENT IN PROJECTION IMAGING SYSTEMS
摘要
An in-situ apparatus for high resolution imaging in lithographic steppers and scanners (machines) is described. It comprises a multiple field in-situ imaging objective that images the source directly onto the machine reticle or objective plane. The image on the wafer side of the machine is then recorded electronically or in photo resist. Alternative embodiments create source images at locations before or beyond the wafer plane that can be more conveniently recorded with sensors embedded in the wafer stage chuck.
申请公布号
WO2005106592(A2)
申请公布日期
2005.11.10
申请号
WO2005US12498
申请日期
2005.04.12
申请人
LITEL INSTRUMENTS;SMITH, ADLAI, H.;HUNTER, ROBERT, O., JR.;MCARTHUR, BRUCE
发明人
SMITH, ADLAI, H.;HUNTER, ROBERT, O., JR.;MCARTHUR, BRUCE