Method for manufacturing large area stamp for nanoimprint lithography

摘要

Provided is a method for manufacturing a large area stamp for nanoimprint lithography using a fabricated small area stamp. The method includes: fabricating a first small area stamp having a pattern less than a few hundred nanometers; and fabricating a second large area stamp having a pattern less than a few hundred nanometers by a step-and-repeat method using the fabricated first small area stamp.