Method of forming self-aligned contact in fabricating semiconductor devices,申请号KR20040011082-传众专利搜索

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发明名称	Method of forming self-aligned contact in fabricating semiconductor devices
摘要
申请公布号	KR100526059(B1)	申请公布日期	2005.11.08
申请号	KR20040011082	申请日期	2004.02.19
申请人		发明人
分类号	H01L21/28;H01L21/3205;H01L21/4763;H01L21/60;H01L21/768;H01L21/8242;(IPC1-7):H01L21/28	主分类号	H01L21/28
代理机构		代理人
主权项
地址

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