| 发明名称 |
Acetal compound, polymer, resist composition and patterning process |
| 摘要 |
Acetal compounds in which a 5- or 6-membered ring acetal structure is connected to a norbornene structure through a linker represented by -(CH<SUB>2</SUB>)<SUB>m</SUB>- in which one hydrogen atom may be substituted with a hydroxyl or acetoxy group, and m is from 1 to 8 are novel. Using the acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.
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| 申请公布号 |
US6962767(B2) |
申请公布日期 |
2005.11.08 |
| 申请号 |
US20020315069 |
申请日期 |
2002.12.10 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
WATANABE TAKERU;KINSHO TAKESHI;HASEGAWA KOJI;NISHI TSUNEHIRO;NAKASHIMA MUTSUO;TACHIBANA SEIICHIRO;HATAKEYAMA JUN |
| 分类号 |
G03F7/039;C07D317/12;C07D317/20;C07D317/24;C07D319/06;C08F32/00;C08F220/10;C08F222/06;C08F222/10;C08G61/02;C08G61/08;(IPC1-7):G03C5/00 |
主分类号 |
G03F7/039 |
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