发明名称 METHOD OF MANUFACTURING SILICON WAFER
摘要 PROBLEM TO BE SOLVED: To provide a silicon wafer manufacturing method capable of easily and inexpensively manufacturing a high-quality silicon wafer for restraining the occurrence of a particle and a slip. SOLUTION: This method manufactures the silicon wafer by performing at least slicing, chamfering, flattening and surface polishing. The silicon wafer manufacturing method removes processing strain caused by mechanical grinding by applying buff polishing without performing the etching of an edge part after grinding, by shaving off the corner of the edge part of the silicon wafer after slicing by the mechanical grinding using a resin bonded grinding wheel of grain sizes 1,500 to 6,000 as a chamfering process. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005305591(A) 申请公布日期 2005.11.04
申请号 JP20040125297 申请日期 2004.04.21
申请人 NAOETSU ELECTRONICS CO LTD 发明人 KOBAYASHI SHOICHI;KOIDE MASAHIKO;TAKEDA MASANORI
分类号 B24B9/00;H01L21/304;(IPC1-7):B24B9/00 主分类号 B24B9/00
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