| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming method and a pattern forming apparatus by which a pattern in a relatively wide region of a square millimeter or larger can be formed in a short time by electrochemical lithographic pattern forming method and the pattern can be formed without using an expensive apparatus such as an AFM (atomic force microscope) and an STM (scanning tunneling microscope). <P>SOLUTION: After an organic material layer 2 such as an organic silane is applied on a substrate 1 having conductivity, a mask 14 made of a conductive material and having a predetermined pattern is mounted on the organic material layer 2 and a voltage is applied between the substrate 1 and the mask 14 in a water-containing atmosphere to form a pattern in the organic material layer 2 corresponding to the mask 14. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
