| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation sensitive resist composition adaptable not only to ultraviolet lights such as an i-line and a g-line but to such radiations as visible lights, excimer lasers of KrF, etc., electron beams, X-rays and ion beams. <P>SOLUTION: The resist composition contains a resist compound (A), an acid generator (B) and an acid crosslinking agent (C). The resist compound (A) has (a) one or more substituents of one or more kinds selected from the group consisting of hydroxyl groups, mercapto groups and amino groups in a molecule; has (b) one or more substituents of one or more kinds selected from the group consisting of urea groups, urethane groups, amide groups and imide groups in a molecule; has (c) a molecular weight of 500-5,000; and has (d) a branched structure. The acid generator (B) directly or indirectly generates an acid when irradiated with any radiation selected from the group consisting of visible lights, ultraviolet lights, excimer lasers, electron beams, X-rays and ion beams, and induces a crosslinking reaction between the resist compound (A) and the acid crosslinking agent (C). In this connection, a portion exposed to the radiation is insolubilized. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
