ALIGNER, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, PATTERN FORMING DEVICE, AND ALIGNING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an aligner and an exposure method by which high overlay accuracy can be achieved without causing any restriction to designing of a device.

SOLUTION: The aligner performs the exposure of a desired pattern to a workpiece via a projection optical system, and is provided with a pattern forming means which has a plurality of pixels, and forms the desired pattern by driving a plurality of the pixels. The pattern forming means has an aligning mark for aligning the relative position of the desired pattern and the workpiece on the nearly same face as the face where the desired pattern is formed.

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