CREATING LAYERS IN THIN-FILM STRUCTURES

摘要

A layer of a material is created in a thin-film structure by coating a substrate (14) in one pass with an ink having a major, fugitive component (13) and at least one minor, non-fugitive component (12) and treating the ink to expel the major component (13) to leave the layer (15) of material. The layer (15) may be an electrically insulating layer having a thickness in the range 0.5 to 10 micrometres, with the ink containing non-fugitive colloidal ceramic nanoparticles having a size in the range 10 to 100 nanometres. The layer (15) may be a process control. layer, such as an etch stop layer or barrier layer. The layer (15) may be an optically emissive layer or a layer of predetermined electrical conductivity.