发明名称 |
Method of growing nitride single crystal on silicon substrate, nitride semiconductor light emitting device using the same, method of manufacturing the same |
摘要 |
A method of growing a nitride single crystal layer, and a method of manufacturing a light emitting device using the method are disclosed. The method of growing a nitride single crystal layer comprises the steps of preparing a silicon substrate having an upper surface of a crystal plane ( 111 ), forming a buffer layer having the formula of Si<SUB>x</SUB>Ge<SUB>1-x</SUB>, (where 0<x<=1) on the upper surface of the silicon substrate, and forming a nitride single crystal on the buffer layer. Also, a nitride light emitting device using the method manufactured by the method, and a method of manufacturing the same are disclosed.
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申请公布号 |
US2005241571(A1) |
申请公布日期 |
2005.11.03 |
申请号 |
US20040007206 |
申请日期 |
2004.12.09 |
申请人 |
SAMSUNG ELECTRO-MECHANICS CO., LTD. |
发明人 |
KIM MIN H.;KOIKE MASAYOSHI;HAHM HUN J. |
分类号 |
C30B29/38;C23C16/34;C30B25/00;C30B25/02;C30B25/18;H01L21/20;H01L21/205;H01L33/06;H01L33/12;H01L33/32;H01L33/34;(IPC1-7):C30B25/00 |
主分类号 |
C30B29/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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